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    Archived pages: 167 . Archive date: 2014-09.

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  • Title: UW WNF JEOL JBX-6300FS E-Beam Lithography
    Descriptive info: JEOL JBX-6300FS E-Beam Lithography.. at the Washington Nanofabrication Facility.. EBeam Home.. News.. Remote Work.. Training.. Documentation.. Process.. Reference.. Site Index.. Website Updates.. Links.. WNF Facility Website.. EBeam Project Highlights.. EBeam Publications.. This is the main site for the JEOL JBX-6300FS Electron Beam Lithography System at the.. Washington Nanofabrication Facility.. at the University of Washington, in Seattle Washington.. If you are just browsing around, you might want to have a look at some.. Project Highlights.. or.. Publications.. from our system.. If you are interested in using the system, there are two primary modes of access:.. With "Remote Access", WNF staff will setup and run your project for you, billing machine time, materials, and staff time used.. For some projects, whether physically local or remote, this is the most efficient choice, since it takes a considerable amount of time  ...   look at the information in the.. section, and the.. section, and talk with me about your possible project.. Don t feel that you have to learn everything in that documentation section; e-beam has a great range of flexibility, and most likely your project will need only a subset of the possible options.. You can work with the staff to learn which options you ll actually need for your project.. If you have any questions at all about our e-beam system, or would like to schedule a meeting to discuss the system and how you might use it for your research, please contact me:.. Rick Bojko.. E-Beam Lithography Engineer.. University of Washington.. 206-616-3534.. bojko@uw.. edu.. (A note about those pesky browser.. Security or Certificate.. warnings.. ).. 2014 Richard Bojko, Univ of Washington (.. Terms.. Privacy.. ).. Contact Me..

    Original link path: /ebeamweb/
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  • Title: News
    Descriptive info: Promotional Materials.. System Photos.. Mar 2014.. Oct 2013.. Dec 2011.. Nov 2011.. Sep 2011.. Jul 2011.. Jun 2011.. Jan 2011.. Oct 2010.. Aug 2010.. Jun 2010.. May 2010.. RSS Feed.. Beamer Update to 4.. 6.. 3.. Mar 15, 2014 10:03 AM.. Our default version of Beamer has been updated to 4.. Lots of changes, but the important ones are highlighted here.. Read More.. Lab Name Change, Domain Change.. Oct 30, 2013 10:36 AM.. Our facility is now known as the Washington Nanofabrication Facility.. Along with the new name, there's a new.. facility website.. And along with the new name, there are new internet domains.. This website is now reachable at:.. http://ebeam.. wnf.. uw.. edu/.. This also the new address for connecting to the ebeam computer for uploading CAD files or pattern processing.. The former MMF names should continue to forward to this new address for the foreseeable future, but you may want to update your  ...   highlights.. are now available, so you can see how some MFF researchers are using our JEOL JBX-6300FS E-beam system.. CAD License Available for UW Personnel.. Nov 01, 2011 12:02 PM.. As of October 2011, UW now has a site license for the full version of.. LayoutEditor.. A license key is available for any University of Washington student, staff or faculty for use on university research.. Contact Rick Bojko (bojko @ uw.. edu) to get a license key.. The program is available for Mac, Windows, and Linux users, and has many very powerful features.. You can find documentation and some nice tutorials online at.. http://www.. layouteditor.. net/wiki/CategoryTutorial.. New Domain Name.. Sep 02, 2011 01:50 PM.. The ebeam computer, and thus this website, now has a new domain name:.. ebeam.. mff.. While the old uwnanop.. org address should forward for the foreseeable future, you might want to go ahead and update your bookmarks to use the new address..

    Original link path: /ebeamweb/news/EBeamNews.html
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  • Title: Remote Work
    Descriptive info: Submitting CAD.. Layout Framework.. Remote Work on the WNF JEOL E-Beam.. For many users, the most efficient means of getting e-beam work done is via our "Remote" program, where your e-beam writing and associated fabrication processing are performed by staff members of the WNF.. Work is billed for equipment usage, staff time, and materials, and all work  ...   for setting up a WNF remote user project are found on the.. WNF Home Page.. In this section, you will fine more specific information and resources for remote usage of the e-beam lithography system.. You can find details about.. Submitting CAD Files here.. Learn about and download our recommended.. CAD design framework for our Silicon Photonics services..

    Original link path: /ebeamweb/remote/index.html
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  • Title: Training
    Descriptive info: Process Map.. Background Reading.. CAD Tutorial (LE).. CAD Tutorial (KLAYOUT).. EBeam Lithography is a highly complex process, in part because of the inherent large number of variables, which give you the high degree of flexibility available, but also require experience and often characterization to narrow down the best operating range.. Due to the complexity, training is not like most fabrication equipment, where one session of a few hours is sufficient to become a skilled user.. Also, the extreme cost and possibility for damage or degradation to the equipment dictate a higher degree of training and supervised operation before a user can be given free access.. So rather than a checkout run, where you are granted open access, the training process for ebeam lithography is a more gradual transition, where we work together at first, scoping out the needs for your project and doing early exposures, and then over time, as you gain understanding, confidence and capability with the system, you will be allowed to do more on your own.. For some users, such as those with low volume and infrequent needs, it may be more efficient to work with me in an ongoing basis, rather than invest the time to become a solo operator; this option exists for E-Beam Lithography, while it doesn't for most other equipment.. If you would like to discuss training options for the system, contact me, (.. ) and we can discuss your needs.. Before you do, though, it would be helpful for you to be aware of a few background requirements for most users.. First, here s my attempt at.. a Process Map.. to show the steps in a successful e-beam write.. There are a lot of complex issues, but you really have to be able to address all of these before you can get a successful exposure.. To help you get started, I recommend that you:.. A) Take a look around this website.. There's a lot of information here, but it is also still a work-in-progress.. You will find holes and placeholders and notes-to-myself scattered throughout; I m actively working on fleshing out details, but if there are particular subjects that I haven t gotten to yet that you d really like to see covered here, let me know, and I can try to work on those areas next.. B) Get trained in the prerequisite activities.. You will need to be:.. A UW WNF user with keycard access to the cleanroom, and an enabled Coral account.. Trained & Qualified on using the WNF chemical wet benches, so you can spin & develop e-beam resist.. You ll need to use resists, developers, and strippers (solvent and bases).. You ll need to use the resist spinners, the baking hot plates, and general wet chemistry hoods.. Trained & Qualified to use a resist spinner.. There is a now a small hood and spinner for the exclusive use of users spinning e-beam resist, identified in Coral as SPIN3-EBeam.. Trained & Qualified to use an Optical Microscope at WNF.. You ll pretty much always look at your patterns with an optical microscope, so you should be skilled at using one or more of the optical microscopes in the WNF (Leica, Nikon, or Zeiss).. Trained, Qualified, and Experienced using an SEM.. The WNF has a JEOL JSM-7400F high-resolution, cold-field-emitter SEM, located just outside the door to the e-beam room.. Conveniently enough for you  ...   we can plan your path toward qualification.. What to Expect During Training.. With simple tools, training and certification is typically a two-step process:.. 1) The equipment trainer leads a training session, in which they discuss the equipment and demonstrate the operation, often with a small group.. 2) "Check-out", in which the trainee runs the equipment independently under the supervision of the trainer.. Assuming safe and successful operation, the trainee is qualified to operate that equipment independently.. By comparison, E-Beam is very complex, in many ways: the flexibility and options during job setup, the complexity of setup and calibration, the highly-variable priorities and trade-offs during operation, the wide range of process variables.. Taken together, the path to e-beam checkout is a bit longer.. Instead of a single binary step, it might look a bit more like this diagram, in which it takes multiple steps toward independent operation, with most operators learning incrementally over 4-6 runs.. This depends largely on your experience, and how much effort you put in.. This also depends somewhat on the complexity of your task.. For example, I strongly recommend that a first exposure be a single-layer (non-aligned) exposure, in which you learn this simpler case of tool operation before adding the considerable complexity of alignment to the mix.. E-Beam training a multi-step process, not as binary as simpler equipment and processes.. There is another dimension to the training period -- another tradeoff to be made.. I call this one the "Productivity Tradeoff", and I diagram this below.. The trade-off here is how quickly you want to learn to be independent, and how quickly you want to get your first successful sample.. There is a trade-off here.. If you prioritize getting your sample as fast as possible, the best way to that is for me to drive the first setup and exposure as quickly as possible.. You'll get your wafer, but not much education.. On the other hand, if you have time, we can step very slowly through every step, decision, and trade-off of the setup, preparation, and calibration steps, but the time to your first wafer will be much longer.. You will drive how we allocate time during training, but there is a trade-off between learning to be independent and getting your desired sample faster.. Most commonly, we work somewhere in the middle of those two extremes, balancing productivity with education.. I'll work with you for a while, maybe a few hours, but then we switch over to "productivity" and just run your sample.. This seems to work best for most people; it allows the learning to be incremental and backed by the experience of seeing the results and iterating.. This is particularly true with new and experimental processes where I often can't even tell you the best methods to use; we may have to do some experimentation and characterization to find the best operating parameters.. When you are brand new to the e-beam field, this can all be very dazzling and confusing, so it make best sense to work in smaller steps toward the end goal.. The main point here is that to a large extent, YOU will drive this trade-off.. When we start, I will ask you how fast you want to work and where on the balance of getting work out versus learning to be independent more quickly you would like to be, and that's how we'll proceed..

    Original link path: /ebeamweb/training/trainingmain.html
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  • Title: Documentation
    Descriptive info: Overview.. Safety.. CAD.. PatternPrep.. JobFiles.. Exposure.. JEOL Documentation.. Operation.. Documentation Overview.. Here you will find lots of documentation about using our e-beam system.. You will note that much of this will require you to be an authenticated user of the e-beam system and enter a username & password to prove it.. The reason for this security is that the information contained in these restricted documents are considered proprietary or commercially sensitive by the respective authors, and we cannot publicly release these details.. (In other words, they don t want their competition to know all the details about their hardware or software.. ) If you  ...   should probably start by reviewing.. this brief overview of the process.. It gives some very important background information about how the overall process works.. You should also review the important information on the.. Safety page.. ; while e-beam is not a particularly risky operation, we want to make sure everyone remains as healthy as when they started.. Restricted Documentation.. When you re ready for in-depth details, here are some other (protected) links you can use:.. GenISys.. - pattern data processing software.. JEOL system documentation.. A veritable wall of documentation.. Useful as a reference, but probably not so useful if you re just getting started..

    Original link path: /ebeamweb/doc/documentation.html
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  • Title: Process
    Descriptive info: PMMA.. P(MMA-MAA) Copolymer.. ZEP-520A.. HSQ.. ma-N 240x.. Resist Process Information.. At present, we have 4 resists available in a variety of thicknesses.. We have a very limited resist budget, and all of these resists are very expensive (the latter three all cost ~ > $1000 per 100 mL !!) So please work carefully, and try to use as little resist volume as possible.. Positive  ...   of PMMA, lower contrast but lower dose, usually used for multi-layer resist structures for liftoff.. high resolution (some say better than PMMA, some say worse), medium contrast (somewhat higher than PMMA, although some report somewhat worse), somewhat better etch resistance.. Negative Resists.. ma-N 2400.. high resolution, high contrast, decent etch resistance.. very high resolution, very low sensitivity (=high dose), inorganic - forms SiO2 when exposed..

    Original link path: /ebeamweb/process/processmain.html
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  • Title: Reference
    Descriptive info: Condition Files.. Aperture Table.. PATH Definitions.. Holders.. Calculators.. Coordinate Modes.. TXL Reference.. Reference Data.. This section holds system-specific information that is subject to change over time, or with system maintenance.. (size and position of final apertures).. Condition Files.. (EOS column settings).. (definitions of recommended PATHs to  ...   Sizes - Lens Modes - Grid Sizes.. Mode.. Terminology.. Field Size.. Machine Grid Size.. Higher-Resolution.. 5th Lens Mode.. EOS Mode 6.. 62.. 5 um.. 0.. 125 nm.. Higher-Speed.. 4th Lens Mode.. EOS Mode 3.. 500 um.. 1.. 0 nm.. Dose Calculation.. More information about dose.. Index..

    Original link path: /ebeamweb/ref/reference.html
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  • Title: Site Index
    Descriptive info: A.. B.. C.. D.. E.. F.. G.. I.. J.. K.. L.. M.. N.. O.. P.. Q.. R.. S.. T.. U.. V.. W.. X.. Y.. Z.. ACHK, Array Check, for viewing jobfile layout.. AE Mark.. Description & Image.. Initialize with.. INITAE.. Alignment, in Job Files.. Aperture Table (Aperture Positions).. Array Check, Viewing Job File Layouts.. Arrays, in Job Files.. Astigmatism.. , Adjustment with SFOCUS.. AutoCAD, why to not use.. Averaging Exposure Methods.. BE Mark.. INITBE.. Beam Diameter.. Bias, in LayoutBEAMER.. Bilayer Resist for liftoff.. Bordering, in LayoutBEAMER.. Formats.. KLAYOUT.. Tutorial using KLayout.. Tutorial using LayoutEditor.. Calibration.. Recommended Sequence.. Dose.. Clock Frequency.. Minimum Dose.. Minimum Shot Pitch.. Dose from MODULAT.. MODULAT from Dose.. Run Time Estimate.. Die Per Wafer.. Checklist,.. for Job Files.. Chemicals, Safety.. CIF, CAD File Format.. Clock, Calculator.. Coarse/Fine Pattern Split, in LayoutBEAMER.. Compiling a job file set (SCHD).. List & Status.. Selecting.. Coordinate Modes, Diagram.. Copolymer PMMA Resist.. CTXT Pattern Data Format.. Description.. CURRNT.. , Measuring Beam Current.. Datatype.. Limit.. For Dose Assignment.. Design Framework.. Desktops.. (Workspaces) in the user interface.. Diameter, Beam.. Die Per Wafer Calculator.. Directories.. Job.. Pattern.. DISTBE.. , Field Distortion Correction.. Definition.. In Design.. In Job File.. In Pattern Prep.. Mapping, in LayoutBEAMER.. DXF, CAD File Format.. EBEAM.. , computer which hosts LayoutBEAMER.. EOSSET.. , choosing condition file.. Evaportion, for liftoff.. Example Job Files.. EXPOSE Program..  ...   File.. JDI Files.. - Job Dose Include.. Job Files.. Compiling with SCHD.. Viewing Layout, with ACHK.. KLAYOUT, CAD Program.. Program.. Tutorial.. Website.. (External).. Layer.. LayoutBEAMER (GenISys).. LayoutEditor, CAD Program.. Liftoff, angle diagram.. Loading Holders.. LTXT (text pattern format).. Quick Reference.. Machine Grid.. ma-N Resist.. Manual Field Placement, in LayoutBEAMER.. Material Safety Data Sheets.. Minimum Dose, Calculator.. MODMOD.. , modify a MODULAT table.. MODULAT command.. Calculator, from Dose.. In JDF File.. Moving the stage.. MSDS.. Operating, Basics.. Overlap Writing.. PATH.. Description of PATH command and usage.. In JDF Files.. Table of defined PATHs.. PDEFBE - Calibrating the PDEF deflection.. Photos, System.. Piece Holders.. PMMA Resist.. PMMA Copolymer Resist.. Proximity Effect Correction.. (PEC).. References, Books and Websites.. Remote Foundry EBeam Services.. Resist Data.. Revision, Website Update History.. Rules, Safety.. Runtime Estimator (Calculator).. SCHD, job deck compiler.. SDF (Schedule) Files.. SEM Mode.. SFOCUS.. Adjustment.. Moving to a new Knife Edge position.. Shape Fracturing.. Shot Pitch, Definition.. Silicon Photonics Layout Framework.. Sleeving, in LayoutBEAMER.. Stage, moving the stage.. Stage Coordinates.. Stigmation,.. beam adjustment with SFOCUS.. Stitching, Field.. Design.. SUBDEFBE.. - calibration of subfield gain and rotation.. Substrate Coordinates.. Time, Runtime Estimator (Calculator).. TXL Pattern Format Reference.. Unloading Holders.. Updates, EBeam Website History.. Uploading Pattern Data Files.. How To.. Web Upload Page.. Videos, GenISys Training.. Virtual Chip Marks.. Example.. Workspaces.. (Desktops) in the user interface.. ZEP-520A Resist..

    Original link path: /ebeamweb/SiteIndex/SiteIndex.html
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  • Title: Website Updates
    Descriptive info: Website Update History.. 03-May-2014.. Added many more.. publications.. 29-Mar-2014.. Add detailed descriptions of.. 13-Mar-2014.. Update.. job & exposure Checklist.. , a list of frequently-made-errors.. 10-Mar-2014.. Add information about using our.. EBeam services remotely.. , including details about how to.. Upload CAD Design Files.. , and our.. standard Layout Design Framework.. 08-Mar-2014.. Add a list of.. enabled by using our EBeam system.. 06-Feb-2014.. Add.. Calculator.. to predict Stage & Substrate Coordinates from measured PreAlignment Microscope (PAM) Coordinates.. Add diagram of various.. coordinate mode.. orientations.. 30-Jan-2014.. Finally created a.. CAD tutorial section.. specifically geared toward new users of LayoutEditor.. 20-Jan-2014.. Working on a fairly comprehensive update, including details such as the facilities name change from MFF to WNF.. Like so many websites, this is now partially, but only partially, complete.. So pretend there's one of those little "Under construction" signs on pretty much every page.. Working on expanding the Alignment details, starting with some.. example CAD files.. with alignment marks.. Add a.. Die Per Wafer calculator.. (from a third party) for figuring out how many chips you can fit on a wafer.. 27-Jun-2013.. Added diagram and photo of.. sample holders.. 29-Apr-2013.. spin-speed curves for P(MMA-MAA) Copolymer resist.. , to fix an error in the graph titles which had the wrong solvent named (is Ethyl Lactate, not Anisole.. ).. 08-Feb-2013.. spin-speed curves for ZEP-520A.. resist dilutions to match dilutions we have, and using measured data.. 07-Feb-2013.. Add estimates for load/unload/calibrate, and alignment overhead to.. Job Time Estimator.. 28-Jan-2013.. Update LayoutBeamer.. ,.. Application Notes for JEOL.. , and.. Training Videos.. to version 4.. 4.. 2.. 25-Jan-2013.. Add a  ...   so much to say about alignment.. 07-Jan-2012.. Add page describing.. averaging techniques.. of OVERLAP and FIELD SHIFT writing.. 13-Dec-2011.. Internal fix to.. which should make them work with Chrome again.. Add to.. Minimum ShotPitch.. calculator field for Minimum MODULAT and Multipass/Field Shift / Overwrite.. Add some.. 10-Dec-2011.. Update GenISys LayoutBEAMER version and add.. 08-Dec-2011.. Correct dimensions in Holder description of.. UW piece holder.. 28-Nov-2011.. Add some examples in LayoutBEAMER, including a detailed description of shape.. Fracturing.. BIAS.. Coarse/Fine split.. Also manual.. Field Placement.. 25-Nov-2011.. Add data and examples for.. P(MMA-MAA) Copolymer resist.. Fix various typos and bad links that slipped through the quality control department.. 13-Nov-2011.. Many updates, primarily to.. Operations.. section, especially.. Basics.. and.. Also more detailed description of using.. PATH.. 16-Oct-2011.. details.. 15-Oct-2011.. Updated.. process.. information.. 29-Aug-2011.. training.. summary.. 01-Aug-2011.. Many updates - Add.. section (mostly password protected).. Trying to flesh out weak and incomplete sections, though many still remain.. Change to new format which allows more hierarchy depth of documents.. 14-Jun-2011.. Add mandated links in each page footer to UW s website.. terms.. privacy policy.. 14-May-2011.. Add new calculator for.. Minimum Usable Shot Pitch.. 9-Apr-2011.. Revise the samples in the.. CAD/Layout/Design Tutorial.. Section.. Hopefully a bit more clear now.. 26-Mar-2011.. ( Still rough around the edges and not yet complete, but it s a start.. Update details on.. Manual Dose assignment,.. now the Layer or Datatype Mapping to Dose now works in LayoutBEAMER.. 06-Mar-2011.. Expand.. holder information.. 02-Mar-2011.. Add window coordinates for.. UW piece part holder.. 25-Feb-2011.. Update LayoutBEAMER manual to v4.. 1.. Add LayoutBEAMER training videos (under Documentation, Pattern Prep)..

    Original link path: /ebeamweb/updates/website_updates.html
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  • Title: Project Highlights
    Descriptive info: Graphene Devices.. Biomechanics.. Nanowires.. Diamond Photonics.. Nanoelectronics.. Nanomagnetics.. Zone Plates.. Silicon Photonics.. Photonic Crystals.. Mid-IR Photonics.. Photonics Prototyping.. Greyscale EBL.. Gratings.. Here are a few highlights from selected projects using our JEOL JBX-6300FS E-Beam Lithography System.. Applications.. Graphene Optoelectronics.. Cell Biomechanics.. .. Silicon Nanowires.. Diamond Photonics for Quantum Information Processing.. Nanoelectronics with Compound Semiconductors.. Silicon Photonics Applications.. Silicon Photonics Baseline Process.. Mid-IR Silicon Photonics.. Process Capabilities.. Greyscale (3D) Resist Profiling..

    Original link path: /ebeamweb/news/projects/index.html
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    Archived pages: 167